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Uniconon sincerely invites you to attend the 2024 SEMICON CHINA event in Shanghai

2025-09-02 15:23:22 admin

Dear customer friends:

Unicon Technology Co., Ltd. will participate in the SEMICON CHINA event located at the New International Expo Center on Longyang Road, Shanghai from March 20th to 22nd, 2024, with multiple models. OurBooth number: N1671.Welcome to visit and experienceThere will also be surprise gifts on the spot.

Exhibition hall floor plan

Exhibition Time

March 20th - 22nd, 2024

Exhibition Venue

Shanghai New International Expo Center

Booth: N1.1671

Official registration entrance Click to enter

There will be mysterious activities on the booth site

Looking forward to your participation

Exhibition equipment


F50 Film thickness Measuring instrument
The F50 can achieve maximum straightness very simplyThickness distribution map of the sample film with a diameter of 450 millimeters. The r-θ polar coordinate moving platform is adoptedIt can quickly locate the required test points and obtain the test thickness in real time, approximatelyTest two points per second.
Related applicationsSemiconductor manufacturing (photoresist, oxides/nitrides /SOI, wafer backside grinding); LCD liquid crystal display (polyimide, ITO transparent conductive film); Optical coating (hard coating, anti-reflection layer); MEMS micro-electromechanical systems (photoresist, silicon-based film layers).


P7 Step gauge
The P-7 can perform 2D and 3D measurements of step height, roughness, warpage and stress, and its scanning can reach 150mm without image stitching.
Related applicationsFilm/thick film steps Etching depth measurement Photoresist/photoresist step Flexible film Characterization of surface roughness/flatness; Surface curvature and contour analysis; 2D stress measurement of thin films Surface structure analysis 3D contour imaging of the surface Defect characterization and defect analysis.


R50 Four-probe Resistivity meter
The Filmetrics R50 series offers contact four-point probe (4PP) and non-contact eddy current (EC) measurements. The resistivity/conductivity of the conductive film is mapped at the fastest speed of 1 point per second. The electric X-Y stage uses standard wafer suction cups to customize sample racks, capable of measuring samples up to 300mm in size or an area of 200mm.
Related applicationsSilicon wafer doping Metal layer thickness test Wafer resistivity test


Bowman XRF Coating Thickness gauge
It has a 12 x12-inch measurable area superior to similar products on workpieces with a height not exceeding 9 inches. The automatic multi-collimator allows for the selection of spot sizes to accommodate various feature sizes. The zoom camera allows for measurements within a focal length range of 0.25 inches to 3.5 inches.
Related applicationsTest of refractive index extinction coefficient of materials Testing of the thickness of the natural oxide layer on silicon wafers Test of optical constants of photoresist Measurement of metal thickness on silicon in the back-end packaging of semiconductors


FS-1 multi-wavelength ellipsometer
The Film Sense FS-1 multi-wavelength ellipsometer adopts a long-life LED light source and a non-moving component ellipsometer detector, enabling reliable film measurement in a compact ellipsometer with simple operation.
Related applicationsSilicon dioxide and nitrides, high dielectric and low dielectric materials, amorphous and polycrystalline materials, silicon films, photoresists.High and low index films, such as SiO2, TiO2, Ta2O5, MgF2.TCO (such as ITO), amorphous silicon thin films, organic thin films (OLED technology), etc